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 <title>iMechanica - Nanoscale holographic interferometry for strain measurements in electronic devices da Nature di Etienne Snoeck  Nanoscale hologr - Comments</title>
 <link>http://imechanica.org/node/3406</link>
 <description>Comments for &quot;Nanoscale holographic interferometry for strain measurements in electronic devices da Nature di Etienne Snoeck  Nanoscale hologr&quot;</description>
 <language>en</language>
<item>
 <title>Nanoscale holographic interferometry for strain measurements in electronic devices da Nature di Etienne Snoeck  Nanoscale hologr</title>
 <link>http://imechanica.org/node/3406</link>
 <description>&lt;p&gt;&lt;a href=&quot;http://dx.doi.org/10.1038/nature07049&quot; target=&quot;_blank&quot; class=&quot;entry-title-link&quot;&gt;Nanoscale holographic interferometry for strain measurements in electronic devices&lt;img class=&quot;entry-title-go-to&quot; src=&quot;http://www.google.com/reader/ui/2412528845-go-to.gif&quot; alt=&quot;&quot; width=&quot;18&quot; height=&quot;18&quot; /&gt;&lt;/a&gt;&lt;/p&gt;
&lt;p&gt;&lt;span class=&quot;entry-source-title-parent&quot;&gt;da &lt;a href=&quot;http://www.google.com/reader/view/feed/http%3A%2F%2Fwww.nature.com%2Fnature%2Fcurrent_issue%2Frss&quot; target=&quot;_blank&quot; class=&quot;entry-source-title&quot;&gt;Nature&lt;/a&gt;&lt;/span&gt; di &lt;span class=&quot;entry-author-name&quot;&gt;Etienne Snoeck&lt;/span&gt;&lt;/p&gt;
&lt;p&gt;
&lt;strong&gt;Nanoscale holographic interferometry for strain measurements in electronic devices&lt;/strong&gt;
&lt;/p&gt;
&lt;p&gt;
Nature 453, 1086 (2008). &lt;a href=&quot;http://dx.doi.org/10.1038/nature07049&quot; target=&quot;_blank&quot;&gt;doi:10.1038/nature07049&lt;/a&gt;
&lt;/p&gt;
&lt;p&gt;
Authors: Martin H&amp;yuml;tch, Florent Houdellier, Florian H&amp;uuml;e&lt;br /&gt;
&amp;amp; Etienne Snoeck
&lt;/p&gt;
&lt;p&gt;
Strained silicon is now an integral feature of the latest generation&lt;br /&gt;
of transistors and electronic devices because of the associated&lt;br /&gt;
enhancement in carrier mobility. Strain is also expected to have an&lt;br /&gt;
important role in future devices based on nanowires and in&lt;br /&gt;
optoelectronic components. Different strategies have been used to&lt;br /&gt;
engineer strain in devices, leading to complex strain distributions in&lt;br /&gt;
two and three dimensions. Developing methods of strain measurement at&lt;br /&gt;
the nanoscale has therefore been an important objective in recent years&lt;br /&gt;
but has proved elusive in practice: none of the existing techniques&lt;br /&gt;
combines the necessary spatial resolution, precision and field of view.&lt;br /&gt;
For example, Raman spectroscopy or X-ray diffraction techniques can map&lt;br /&gt;
strain at the micrometre scale, whereas transmission electron&lt;br /&gt;
microscopy allows strain measurement at the nanometre scale but only&lt;br /&gt;
over small sample areas. Here we present a technique capable of&lt;br /&gt;
bridging this gap and measuring strain to high precision, with&lt;br /&gt;
nanometre spatial resolution and for micrometre fields of view. Our&lt;br /&gt;
method combines the advantages of moir&amp;eacute; techniques with the flexibility&lt;br /&gt;
of off-axis electron holography and is also applicable to relatively&lt;br /&gt;
thick samples, thus reducing the influence of thin-film relaxation&lt;br /&gt;
effects.
&lt;/p&gt;
&lt;p&gt;
&amp;nbsp;
&lt;/p&gt;
&lt;br class=&quot;clear&quot; /&gt;</description>
 <comments>http://imechanica.org/node/3406#comments</comments>
 <category domain="http://imechanica.org/taxonomy/term/76">research</category>
 <category domain="http://imechanica.org/taxonomy/term/185">experimental mechanics</category>
 <pubDate>Wed, 25 Jun 2008 16:39:22 -0400</pubDate>
 <dc:creator>Mike Ciavarella</dc:creator>
 <guid isPermaLink="false">3406 at http://imechanica.org</guid>
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