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Nonlinear Stability Analysis of Self-assembling Nanoscale Patterns
I thought I should take advantage of iMechanica and obtain feedback on some recent work that we did on nonlinear stability analysis of patterns.
A paradigmatic model that governs monolayer self-assembly was constructed a few years back by Wei Lu (Michigan) and Zhigang Suo. Apart from obtaining several physical insights they also conducted a linear stability analysis of their model. Borrowing technqiues from the nonlinear physics community, our work presents nonlinear stability analysis i.e. the initial state is no longer homogeneous and stable states beyond the transition are calculated. This allows a detailed construction of stability maps for various patterns without extensive numerical calculations.
This work is currently under review and I am attaching a pre-print with this post. Any comments and suggestions would be well-appreciated.