History

Blog

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Member for

2 years 8 weeks

My profile

Full name

Youbo Lin

URL of homepage

http://esag.harvard.edu/lin/

Job function

Researcher

Job sector

University

Company or institution

Harvard University

Title of group

Vlassak Research Group

Doctoral thesis advisor

Joost J. Vlassak

My resume

Resume

Selected Publications:

Y. Lin, T. Y. Tsui, and J. J. Vlassak, “Adhesion Degradation and Water Diffusion in Nanoporous Organosilicate Glass Film Stack”, to be submitted.
Y. Lin, Y. Xiang, T. Y. Tsui, and J. J. Vlassak, “PECVD Low-k Organosilicate Coatings: Adhesion, Fracture and Mechanical Properties”, to be submitted.
Y. Lin, T. Y. Tsui, and J. J. Vlassak, “Water Diffusion and Fracture in Organosilicate Glass Film Stacks”, Acta Materialia, 55, 2455-2464 (2007).
Y. Lin, T. Y. Tsui, and J. J. Vlassak, “Octamethylcyclotetrasiloxane-based Low-permittivity Organosilicate Coatings: Composition, Structure and Polarizability”, Journal of The Electrochemical Society, 153 (7), F144-F152 (2006).
J. J. Vlassak, Y. Lin, and T. Y. Tsui, “Fracture of Organosilicate Glass Thin Films: Environmental Effects”, Materials Science and Engineering A, 391, 159-174 (2005).
Z. Li, R. G. Gordon, D. B. Farmer, Y. Lin, and J. J. Vlassak, "Nucleation and Adhesion of ALD Copper on Cobalt Adhesion Layers and Tungsten Nitride Diffusion Barriers", Electrochemical and Solid-State Letters, 8 (7), G182-G185 (2005).
Y. Lin, J. J. Vlassak, T. Y. Tsui, and A. J. McKerrow, “Subcritical Delamination of Dielectric and Metal Films from Low-k Organosilicate Glass (OSG) Thin Films in Buffered pH Solutions”, MRS Symposium Proceedings, 795, 93-98 (2004).
Y. Lin, J. J. Vlassak, T. Y. Tsui, and A. J. McKerrow, “Environmental effects on subcritical delamination of dielectric and metal films from organosilicate glass (OSG) thin films”, MRS Symposium Proceedings, 766, 171-176 (2003).